Diamond nanopatterns fabricated by room-temperature nanoimprinting technology with diamond molds using polysiloxane

Journal of Materials Science: Materials in Electronics

Volumn 17, Issue 3, 2006, Pages 199-203

  Kiyohara, Shuji ^a   Fujiwara, Makoto ^a   Matsubayashi, Fumio ^a   Mori, Katsumi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; ELECTRON BEAM LITHOGRAPHY; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; OXYGEN; PLASMA ETCHING; PRESSURE EFFECTS; SILICONES;

CONVEX LATTICE; DIAMOND MOLD; DIAMOND NANOPATTERN; OXYGEN PLASMA ETCHING; ROOM-TEMPERATURE NANOIMPRINTING;

SEMICONDUCTING DIAMONDS;

EID: 33646420633     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-006-6761-3     Document Type: Article

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