Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 4, 2005, Pages

  Hohle, Christoph ^a   Heckmann, Nicole ^a   Sebald, Michael ^a   Markert, Matthias ^a   Stepanenko, Nickolay ^a   Houlihan, Francis ^b   Romano, Andrew ^b   Sakamuri, Raj ^b   Rentkiewicz, David ^b   Dammel, Ralph R ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b AZ Electronic Materials USA Corp   (United States)

Author keywords

157 nm; 193 nm; Atomic force microscopy; Etch; Fluoropolymers; Photoresists; Surface roughness

Indexed keywords

157 NM; 193 NM; ETCH; NORBORNENE HOMOPOLYMERS;

ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; PHOTORESISTS; SURFACE ROUGHNESS;

FLUORINE CONTAINING POLYMERS;

EID: 33747620878     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2131101     Document Type: Article

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