Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker

Microelectronic Engineering

Volumn 85, Issue 7, 2008, Pages 1540-1544

  Zaid, H M ^a   Manickam, M ^a   Preece, J A ^a   Palmer, R E ^a   Robinson, A P G ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Chemical amplification; Electron beam resist; Lithography; Melamine; Molecular resist; Photoacid diffusion; Triphenylene

Indexed keywords

DIFFUSION; FILM THICKNESS; LITHOGRAPHY; OPTICAL RESOLVING POWER; SURFACE ROUGHNESS;

CHEMICAL AMPLIFICATION; ELECTRON BEAM RESIST; MOLECULAR RESIST; PHOTOACID DIFFUSION;

MOLECULAR DYNAMICS;

EID: 46549086847     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.02.009     Document Type: Article

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