Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2413-2420

  Pawloski, Adam R ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; CATALYST ACTIVITY; DISSOLUTION; INFRARED SPECTROSCOPY; MONOMERS; NUMERICAL METHODS;

DEPROTECTION; PHOTOACID CONCENTRATION; PHOTOACID GENERATOR;

PHOTORESISTS;

EID: 0036883106     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1525811     Document Type: Article

References (21)

1. K. E. Petrillo et al., J. Vac. Sci. Technol. B 12, 3863 (1994).
2. H. Ito and E. Flores, J. Electrochem. Soc. 135, 2322 (1988).
3. R. Dammel, Diazonaphthoquinone-based Resists, edited by D. C. O'Shea (SPIE Optical Enginering, Bellingham, WH, 1993).
4. S. L. Ablaza, J. F. Cameron, G. Xu, and W. Yueh, J. Vac. Sci. Technol. B 18, 2543 (2000).
5. J. F. Cameron, A. J. Orellana, M. M. Rajaratnam, and R. F. Sinta, Proc. SPIE 2724, 261 (1996).
6. A. R. N. Pawloski, Christian, and P. F. Nealey, Chem. Mater. 14, 4192 (2002).
7. H. Ito, D.-F. Alexander, and G. Breyta, J. Photopolym. Sci. Technol. 10, 397 (1997).
8. F. M. Houlihan et al., Chem. Mater. 12, 3516 (2000).
9. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, IEEE Trans. Electron Devices ED22, 445 (1975).
10. A. R. Pawloski, Christian, and P. F. Nealey, Chem. Mater. 13, 4154 (2001).
11. F. Cerrina, F. Baszler, S. Turner, and M. Khan, Microelectron. Eng. 21, 103 (1993).
12. T. E. May, R. A. Bosch, and R. L. Julian, Proceedings of the 18th Particle Acceleration Conference, 1999, Vol. 4, pp. 2394-2396.
13. -1 for PAG concentrations of 100, 70, 50, and 40 μmol/g, respectively.
14. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, 181 (1993).
15. C. J. Gamsky, G. R. Howes, and J. W. Taylor, Anal. Chem. 66, 1015 (1994).
16. A. R. Pawloski, Christian, and P. F. Nealey, J. Vac. Sci. Technol. B 20, 2162 (2002).
17. T. Kozawa, Y. Yoshida, M. Uesaka, and S. Tagawa, Jpn. J. Appl. Phys. Part 1 31, 4301 (1992).
18. J. Pacansky and R. Waltman, Radiat. Phys. Chem. 25, 625 (1985).
19. J. Pacansky and M. Maier, J. Mol. Struct. 222, 33 (1990).
20. H. Ito, D. Fenzel-Alexander, and G. Breyta, Proc. SPIE 3049, 575 (1997).
21. G. M. Schmid, M. D. Stewart, V. K. Singh, and C. G. Willson, J. Vac. Sci. Technol. B 20, 185 (2002).