Sub-10-nm electron beam lithography using a poly(α-methylstyrene) resist with a molecular weight of 650

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6785-6787

  Manako, Shoko ^a   Fujita, Jun Ichi ^a   Tanigaki, Katsumi ^a,b   Ochiai, Yukinori ^a   Nomura, Eiichi ^a  

^a NEC CORPORATION   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Electron beam lithography; Nanolithography; Organic negative resist; methylstyrene

Indexed keywords

EID: 0012930808     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6785     Document Type: Article

References (9)

1. T. H. P. Chang, D. P. Kern, E. Kratschmer, K. Y. Lee, H. E. Luhn, M. A. McCord, S. A. Rishton and Y. Vladimirsky: IBM J. Res. Develop. 32 (1988) 462.
2. S. P. Beaumont: Microelectron. Eng. 32 (1996) 283.
3. J. Fujita, Y. Ohnishi, Y. Ochiai, E. Nomura and S. Matsui: J. Vac. Sci. Technol. B14 (1996) 4272.
4. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo and L. Zhuang: J. Vac. Sci. Technol. B15 (1997) 2897.
5. H. Kawaura, T. Sakamoto, Y, Ochiai, J. Fujita and T. Baba: Ext. Abstr. 1997 Int. Conf. Solid State Devices and Materials (Business Center for Academic Societies Japan, Tokyo, 1997) p. 572.
6. T. Yoshimura, H. Shiraishi, J. Yamamoto, T. Terasawa and S. Okazaki: Appl. Phys. Lett. 68 (1996) 1799.
7. S. Manako, J. Fujita, Y. Ochiai, E. Nomura and S. Matsui: Jpn. J. Appl. Phys. 36 (1997) L724.
8. Polymer Handbook, eds. J. Brandrup and E. H. Immergut (John Wiley & Sons, Inc., New York, 1989) 3rd ed.
9. S. Manako, J. Fujita, Y. Ochiai, E. Nomura and S. Matsui: Jpn. J. Appl. Phys. 36 (1997) 7773.