Nanolithography using ultrasonically assisted development of calixarene negative electron beam resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 1, 2001, Pages 311-313

  Yasin, Shazia ^a   Hasko, D G ^a   Carecenac, F ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b LAAS CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISTORTION; ELECTRON BEAM LITHOGRAPHY; IMAGE ANALYSIS; PHOTORESISTS; ULTRASONIC APPLICATIONS;

CALIXARENE DERIVATIVES; NEGATIVE RESIST IMAGE DISTORTION;

NANOTECHNOLOGY;

EID: 0035078539     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1342011     Document Type: Article

References (8)

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7. Calixarene supplied by Apin Chemicals Ltd.
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