Development of r.f. sputtered Cu/Si multilayer coatings for X-ray mirror applications

Journal of Optics (India)

Volumn 28, Issue 1, 1999, Pages 1-13

  Bhattacharyya, D ^b   Das, N C ^b   Roy, A P ^b   Chitra, R ^a   Basu, S ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTROMAGNETIC WAVE REFLECTION; ELLIPSOMETRY; GLASS; METALLIC FILMS; METALLIC SUPERLATTICES; MIRRORS; MULTILAYERS; SILICON; SPUTTER DEPOSITION; SURFACE ROUGHNESS; X RAY APPARATUS;

SMALL ANGLE X RAY REFLECTOMETRY; X RAY MULTILAYER MIRRORS;

OPTICAL COATINGS;

EID: 0033276745     PISSN: 09700374     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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