Influence of the reactor wall composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching

Journal of Applied Physics

Volumn 102, Issue 9, 2007, Pages

  Cunge, G ^a   Sadeghi, N ^b   Ramos, R ^a  

^a CEA LETI   (France)

^b LIPHY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ETCHING; SILICON;

DOPPLER WIDTH; GAS PRESSURE; LASER ABSORPTION; MOLE FRACTIONS;

INDUCTIVELY COUPLED PLASMA;

EID: 36249004278     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2803880     Document Type: Article

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