Effects of different plasma species (atomic N, metastable N 2*, and ions) on the optical properties of dilute nitride materials grown by plasma-assisted molecular-beam epitaxy

Applied Physics Letters

Volumn 91, Issue 19, 2007, Pages

  Oye, Michael M ^a   Mattord, Terry J ^a   Hallock, Gary A ^a   Bank, Seth R ^a   Wistey, Mark A ^b   Reifsnider, Jason M ^c   Ptak, Aaron J ^d   Yuen, Homan B ^e   Harris, James S ^e   Holmes, Archie L ^f  

^a The University of Texas at Austin   (United States)

^b University of California   (United States)

^c Samsung Austin Semiconductor   (United States)

^d NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^e STANFORD UNIVERSITY   (United States)

^f University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METASTABLE PHASES; MOLECULAR BEAM EPITAXY; OPTICAL EMISSION SPECTROSCOPY; OPTICAL PROPERTIES; PLASMA THEORY;

ANNEALING TEMPERATURES; IONIC SPECIES; ISONITROGEN;

NITRIDES;

EID: 36049006467     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2806226     Document Type: Article

References (32)

1. C. W. Tu, J. Phys.: Condens. Matter 13, 7169 (2001).
2. J. A. Gupta, P. J. Barrios, G. C. Aers, R. L. Williams, J. Ramsey, and Z. R. Wasilewski, Solid-State Electron. 47, 399 (2003).
3. S. R. Kurtz, A. A. Allerman, E. D. Jones, J. M. Gee, J. J. Banas, and B. E. Hammons, Appl. Phys. Lett. 74, 729 (1999).
4. I. Vurgaftman, J. Appl. Phys. 96, 4653 (2004).
5. K. Karstad, Opt. Lasers Eng. 43, 537 (2005).
6. A. A. Kosterev and F. K. Tittel, IEEE J. Quantum Electron. 38, 582 (2002).
7. S. R. Bank, Electron. Lett. 42, 39 (2006).
8. A. J. Ptak, J. Appl. Phys. 98, 094501 (2005).
9. S. Agarwal, B. Hoex, M. C. M. van de Sanden, D. Maroudas, and E. S. Aydil, Appl. Phys. Lett. 83, 4918 (2003).
10. A. J. Ptak, M. R. Millecchica, T. H. Meyers, K. S. Ziemer, and C. D. Stinespring, Appl. Phys. Lett. 74, 3836 (1999).
11. V. A. Grant, R. P. Campion, C. T. Foxon, W. Lu, S. Chao, and E. C. Larkins, Semicond. Sci. Technol. 22, 15 (2007).
12. J. M. Reifsnider, M. M. Oye, S. Govindaraju, and A. L. Holmes, J. Cryst. Growth 280, 7 (2005).
13. D. Gotthold, S. Govindaraju, T. Mattord, A. L. Holmes, Jr., and B. G. Streetman, J. Vac. Sci. Technol. A 18, 461 (2000).
14. J. M. Reifsnider, J. Cryst. Growth 243, 396 (2002).
15. M. M. Oye, Appl. Phys. Lett. 86, 221902 (2005).
16. S. Govindaraju, J. Electron. Mater. 32, 29 (2003).
17. S. Govindaraju, J. Electron. Mater. 33, 851 (2004).
18. E. Iliopoulos, A. Adikimenakis, E. Dimakis, K. Tsagaraki, G. Konstantinidis, and A. Georgakilas, J. Cryst. Growth 278, 426 (2005).
19. T. Kikuchi, A. S. Somintac, O. Ariyada, M. Wada, and T. Ohachi, J. Cryst. Growth 292, 221 (2006).
20. H. Carrere, A. Arnoult, E. Bedel-Pereira, and A. Ricard, J. Vac. Sci. Technol. B 22, 2448 (2004).
21. W. C. Hughes, J. Vac. Sci. Technol. B 13, 1571 (1995).
22. D. C. Jordan, B. T. Burns, and R. B. Doak, J. Appl. Phys. 89, 883 (2001).
23. V. Guerra and J. Loureiro, Plasma Sources Sci. Technol. 6, 361 (1997).
24. M. A. Wistey, J. Cryst. Growth 278, 229 (2005).
25. J. Miguel-Sanchez, A. Guzman, U. Jahn, A. Trampert, J. M. Ulloa, E. Munoz, and A. Hierro, J. Appl. Phys. 101, 103526 (2007).
26. M. M. Oye, Ph.D. thesis, The University of Texas at Austin, 2006.
27. S. R. Bank, Appl. Phys. Lett. 88, 221115 (2006).
28. D. C. Frost and C. A. McDowell, Proc. R. Soc. London, Ser. A 236, 278 (1956).
29. A. Jenichen, Phys. Status Solidi B 242, 2820 (2005).
30. V. Lordi, Phys. Rev. Lett. 90, 145505 (2003).
31. M. Reason, H. A. McKay, W. Ye, S. Hanson, R. S. Goldman, and V. Rotberg, Appl. Phys. Lett. 85, 1692 (2004).
32. M. M. Oye, S. Govindaraju, R. Sidhu, J. M. Reifsnider, and A. L. Holmes, Jr., Appl. Phys. Lett. 86, 151903 (2005).