Nitrogen plasma optimization for high-quality dilute nitrides

Journal of Crystal Growth

Volumn 278, Issue 1-4, 2005, Pages 229-233

  Wistey, Mark A ^a   Bank, Seth R ^a   Yuen, Homan B ^a   Bae, Hopil ^a   Harris Jr , James S ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

A1. Defects; A1. Plasmas; A3. Molecular beam epitaxy; B1. Dilute nitrides; B2. Semiconducting gallium arsenide

Indexed keywords

CRYSTAL DEFECTS; ELECTRIC POTENTIAL; MOLECULAR BEAM EPITAXY; NITROGEN; OPTIMIZATION; PHOTOLUMINESCENCE; PLASMAS; SEMICONDUCTING GALLIUM ARSENIDE;

DILUTE NITRIDES; FABRICATION TECHNOLOGY; LANGMUIR PROBE; PLASMA CELLS;

NITRIDES;

EID: 18444388311     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.12.060     Document Type: Conference Paper

References (16)

1. M. Kondow, T. Kitatani, S. Nakatsuka, M.C. Larson, K. Nakahara, Y. Yazawa, M. Okai, and K. Uomi IEEE J. Sel. Top. Quantum Electron. 3 1997 719
2. S.R. Bank, M.A. Wistey, L.L. Goddard, H.B. Yuen, V. Lordi, and J.S. Harris IEEE J. Quantum Electron. 40 2004 656
3. M.A. Wistey, S.R. Bank, H.B. Yuen, L.L. Goddard, and J.S. Harris Electron. Lett. 39 2003 1822
4. R.P. Vaudo, Z. Yu, J.W. Cook, and J.F. Schetzina Opt. Lett. 18 1993 1843
5. A. Lofthus, and P.H. Krupenie J. Phys. Chem. Ref. Data 6 1977 113 http://www.nist.gov/srd/PDF%20files/jpcrd93.pdf
6. A.V. Blant, O.H. Hughes, T.S. Cheng, S.V. Novikov, and C.T. Foxon Plasma Sources Sci. T 9 2000 12
7. T. Kageyama, T. Miyamoto, S. Makino, F. Koyama, and K. Iga J. Crystal Growth 209 2000 350
8. V. Gambin, Private communication;
9. Also M. Oye and coworkers at University Texas-Austin.
10. M. Fischer, D. Gollub, M. Reinhardt, M. Kamp, and A. Forchel J. Crystal Growth 251 2003 353
11. M.A. Wistey, S.R. Bank, H.B. Yuen, L.L. Goddard, T. Gugov, J.S. Harris, Protecting wafer surface during plasma ignition using an arsenic cap, J. Vac. Sci. Technol. B, in press.
12. W.C. Hughes, W.H. Rowland, M.A.L. Johnson, S. Fujita, J.J.W. Cook, J.F. Schetzina, J. Ren, and J.A. Edmond J. Vac. Sci. Technol. B 13 1995 1571
13. R.J. Molnar, R. Singh, and T.D. Moustakas J. Electron. Mater. 24 1995 275
14. R.J. Molnar, and T.D. Moustakas J. Appl. Phys. 76 1994 4587
15. M.A. Wistey, S.R. Bank, H.B. Yuen, J.S. Harris, North American MBE Conference, Keystone, CO, 2003.
16. M.A. Wistey, S.R. Bank, H.B. Yuen, J.S. Harris, M.M. Oye, A.L. Holmes, Using beam flux monitor as Langmuir probe for plasma-assisted molecular beam epitaxy, J. Vac. Sci. Technol. B, in press.