Deposition mechanism of SiO2 chemical vapor deposition using tetra-isocyanate silane and water

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 9 A, 2000, Pages 5164-5168

  Fujimoto, Akira ^a   Sugiura, Osamu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; SILANES; SUBSTRATES; WATER;

ISOTHERM THEORY;

SILICA;

EID: 0034266867     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5164     Document Type: Article

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