|
Volumn 396, Issue 1-2, 2001, Pages 9-15
|
Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition
|
Author keywords
Chemical vapor deposition; Ion bombardment; Plasma processing and deposition; Silicon oxide
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
ION BEAMS;
ION BOMBARDMENT;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICA;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
NUCLEAR REACTION ANALYSIS (NRA);
THIN FILMS;
|
EID: 0035928994
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01261-5 Document Type: Article |
Times cited : (46)
|
References (34)
|