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Volumn 396, Issue 1-2, 2001, Pages 9-15

Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition

Author keywords

Chemical vapor deposition; Ion bombardment; Plasma processing and deposition; Silicon oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0035928994     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01261-5     Document Type: Article
Times cited : (46)

References (34)
  • 18
    • 0002797460 scopus 로고    scopus 로고
    • Ph. D. Thesis, Universidad Autónoma de Madrid, Spain
    • (1999)
    • Ojeda, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.