Sheath model for dual-frequency capacitively coupled plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5533-5539

  Denpoh, Kazuki ^a   Wakayama, Go ^a,c   Nanbu, Kenichi ^a,b  

^a TOKYO ELECTRON LTD   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c Shinjuku Suzuki Bldg B6 8   (Japan)

Author keywords

Dual frequency; Modeling; PIC MCC; RF discharge; Sheath

Indexed keywords

CURRENT DENSITY; DRY ETCHING; ELECTRIC POTENTIAL; IONIZATION; MAXWELL EQUATIONS; MICROELECTRONICS; MONTE CARLO METHODS; OSCILLATIONS;

CAPACITIVELY COUPLED PLASMA (CCP); IONS IMPINGING; PLASMA POTENTIAL; SHEATH THEORY;

PLASMAS;

EID: 6344229755     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5533     Document Type: Article

References (10)

1. A. Koshiishi, M. Tomoyasu, Y. Tahara and M. Kojima: Proc. Symp. Dry Process, Tokyo, 1998, p. 229.
2. K. Kinoshita, H. Kokura, N. Toyoda, S. Nanko, N. Ozawa, T. Tatsumi, M. Matsui, S. Noda, K. Nakamura, H. Sugai and M. Sekine: Proc. Int. Conf. Phenomena in Ionized Gases, Nagoya, 2001, Vol. 2, p. 77.
3. T. Kitajima, Y. Takeo and T. Makabe: J. Vac. Sci. Technol. A 17 (1999) 2510.
4. T. Kitajima, Y. Takeo, Z. LJ. Petrović and T. Makabe: Appl. Phys. Lett. 77 (2000) 489.
5. G. Wakayama and K. Nanbu: IEEE Trans. Plasma Sci. 31 (2003) 638.
6. C. K. Birdsall: IEEE Trans. Plasma Sci. 19 (1991) 65.
7. M. A. Lieberman: IEEE Trans. Plasma Sci. 16 (1988) 638.
8. K. Kosaki and M. Hayashi: Prep. National Meeting of the Institute of Electrical Engineering Japan, 1992 [in Japanese].
9. K. Nanbu: Jpn. J. Appl. Phys. 33 (1994) 4752.
10. K. Nanbu and Y. Kitatani: J. Phys. D 28 (1995) 324.