Electrochemical trench etching of silicon triggered via mechanical nanocontacts

Electrochimica Acta

Volumn 53, Issue 2, 2007, Pages 758-762

  Gassilloud, R ^a   Schmuki, P ^b   Michler, J ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Anodic etching; Back side illumination; Mechanical contacts; Scratching; Silicon porosification

Indexed keywords

ELECTROCHEMICAL ETCHING; ELECTROLYTES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NUCLEATION;

ANODIC ETCHING; ELECTROCHEMICAL TRENCH ETCHING; MECHANICAL NANOCONTACTS; MICRO-SCRATCHES; NANOCONTACTS; SCRATCHING;

SILICON WAFERS;

EID: 35148894545     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.07.045     Document Type: Article

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