Processing of three-dimensional microstructures using macroporous n-type silicon

Journal of the Electrochemical Society

Volumn 143, Issue 1, 1996, Pages 385-390

  Ottow, S ^a   Lehmann, V ^b   Foll H ^a  

^a UNIVERSITY OF KIEL   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROLYTES; ETCHING; HYDROFLUORIC ACID; MICROMACHINING; MICROSTRUCTURE; POROSITY; THREE DIMENSIONAL;

ANISOTROPIC ETCHING; ELECTROCHEMICAL MACROPORE FORMATION; MACROPOROUS SILICON; THREE DIMENSIONAL MICROSTRUCTURE;

SEMICONDUCTING SILICON;

EID: 0029732934     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836442     Document Type: Article

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