Pillar structures with a sub-micron space fabricated by macroporous-based micromachining

Sensors and Actuators, A: Physical

Volumn 97-98, Issue , 2002, Pages 744-748

  Ohji, Hiroshi ^a   Izuo, Shinichi ^a   French, Patrick J ^b   Tsutsumi, Kazuhiko ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Electrochemical etching; Micro structure; Porous silicon; Sieving

Indexed keywords

DNA; ELECTRON BEAM LITHOGRAPHY; ELECTROPHORESIS; ETCHING; GELS; HYDROFLUORIC ACID; MASKS; MICROMACHINING; MICROSTRUCTURE; OXIDATION; SILICA; SILICON NITRIDE;

DNA SEPARATING DEVICE; ELECTROCHEMICAL ETCHING; HIGH ASPECT RATIO; MACROPOROUS MICROMACHINING; PILLAR STRUCTURES; SIEVING; SUBMICRON SPACE; THERMAL OXIDATION;

POROUS SILICON;

EID: 0036544238     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00015-8     Document Type: Conference Paper

References (5)

1. Monolithic nanofluid sieving structures for DNA manipulation
2. Separation of long DNA molecules in a microfabricated entropic trap array
3. Fabrication of a beam-mass structure using single-step electrochemical etching for micro structures (SEEMS)
4. Formation mechanism and properties of electrochemically etched trenches in n-type silicon
5. Macroporous silicon formation for micromachining