Single step electrochemical etching in ammonium fluoride

Sensors and Actuators, A: Physical

Volumn 74, Issue 1, 1999, Pages 109-112

  Ohji, H ^a   French, P J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CURRENT DENSITY; ETCHING; MICROMACHINING; MORPHOLOGY; OPTIMIZATION; POROUS SILICON; SINGLE CRYSTALS; SURFACES;

AMMONIUM FLUORIDE; ELECTROCHEMICAL ETCHING; ETCHANT; ETCHANT CONCENTRATION; FREE STANDING STRUCTURE; THREE DIMENSIONAL STRUCTURES; WET ETCHING;

AMMONIUM COMPOUNDS;

EID: 0032633051     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00334-3     Document Type: Article

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