Marching of the microlithography horses: Electron, ion, and photon: Past, present, and future

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

e beam lithography; EUV lithography; Ion beam lithography; Microlithography; Microlithography history; Microlithography outlook; Optical lithography; X ray lithography

Indexed keywords

MASKS; PHOTONS; PRINTING; WAVELENGTH; X RAY LITHOGRAPHY;

MICROLITHOGRAPHY HISTORY; MICROLITHOGRAPHY OUTLOOK; PROXIMITY PRINTING;

ELECTRON BEAM LITHOGRAPHY;

ELECTRONS; LITHOGRAPHY; PROJECTION PRINTING;

EID: 35048870599     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.720628     Document Type: Conference Paper

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