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Volumn 3676, Issue I, 1999, Pages 117-125
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Low energy e-beam proximity projection lithography
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC POTENTIAL;
ELECTRIC SPACE CHARGE;
ELECTRON ENERGY LEVELS;
INTEGRATED CIRCUIT MANUFACTURE;
MASKS;
MEMBRANES;
SILICON WAFERS;
SINGLE CRYSTALS;
THERMAL CONDUCTIVITY OF SOLIDS;
INTEGRATED CIRCUIT LITHOGRAPHY;
LOW ENERGY ELECTRON BEAM PROXIMITY PROJECTION LITHOGRAPHY;
PROXIMITY EFFECTS;
ELECTRON BEAM LITHOGRAPHY;
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EID: 0032672989
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.351084 Document Type: Conference Paper |
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Times cited : (5)
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References (13)
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