Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2903-2909

  Utsumi, Yuichi ^a   Kishimoto, Takefumi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

GALVANIZING; MICROELECTRONICS; MICROSTRUCTURE; SYNCHROTRON RADIATION; X RAY ANALYSIS;

HIGH-ENERGY REGIONS; LARGE-AREA PATTERNING; LITHOGRAPHY SYSTEMS; PATTERN THICKNESS;

X RAY LITHOGRAPHY;

EID: 29044435693     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2131880     Document Type: Article

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