Nikon EPL tool: The latest development status and results

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 477-482

  Miuram, Takaharu ^a   Kawata, Shintaro ^a   Hada, Kazunari ^a   Kakizaki, Yukio ^a   Miyazaki, Masaya ^a   Suzuki, Kazuaki ^a   Hirayanagi, Noriyuki ^a   Yamada, Atsushi ^a   Ikeda, Junji ^a   Yahiro, Takehisa ^a   Udagawa, Jin ^a   Takekoshi, Hidekazu ^a   Umemoto, Takaaki ^a   Ohkubo, Yukiharu ^a   Shimoda, Toshimasa ^a   Tanida, Toru ^a   Watanabe, Yoichi ^a   Ohmori, Kaoru ^a   Mori, Futoshi ^a   Takemoto, Shigeru ^a   Yoshioka, Takeshi ^a   Monta Jr , Kenji ^a   more..

^a NIKON CORPORATION   (Japan)

Author keywords

EB stepper; Electron Projection Lithography; EPL; EPL reticle; Sub field stitching

Indexed keywords

GATES (TRANSISTOR); OPTICAL RESOLVING POWER; SILICON WAFERS;

EB STEPPER; ELECTRON PROJECTION LITHOGRAPHY (EPL); EPL RETICLE; SUB-FIELD STITCHING;

PHOTOLITHOGRAPHY;

EID: 24644523579     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598687     Document Type: Conference Paper

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