Development of cleaning process for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Chang, Ching Yu ^a   Yu, D C ^a   Lin, John C H ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Brush and emulsion; Leaching; Mega sonic; Panicle; Stain

Indexed keywords

CLEANING; CONTAMINATION; FLUIDICS; IMAGE PROCESSING; LEACHING; SOLVENTS; TRANSPARENCY;

BRUSH AND EMULSION; MEGA SONIC; PANICLE; STAIN;

LITHOGRAPHY;

EID: 33745790459     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658413     Document Type: Conference Paper

References (3)

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2. Jean M. Bennett, Proc. SPIE 5273, pp. 195-206, 2004
3. Karen Petrillo, Kaushal Patel, Rex Chen, Wenjie Li, Ranee Kwong, Peggy Lawson, Rao Varanasi, Chris Robinson, Steven J. Holmes, Dario Gil, and Kurt Kimmel, Proc. SPIE 5753, pp.52-63, 2005.