Challenges and progress in x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3137-3141

  Silverman, Jerome P ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000543567     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590452     Document Type: Article

References (42)

1. J. P. Silverman, J. Vac. Sci. Technol. B 15, 2117 (1997).
2. J. P. Silverman, in Handbook of Semiconductor Manufacturing Technology, edited by Y. Nishi and R. Doering (Marcel Dekker, New York, to be published).
3. D. E. Andrews et al., Proc. SPIE 1263, 124 (1990).
4. J. P. Silverman, C. N. Archie, D. E. Andrews, and A. J. Weger, Nucl. Instrum. Methods Phys. Res. A 347, 31 (1994).
5. A. C. Chen and J. P. Silverman, Proc. SPIE 2437, 140 (1995).
6. K. Uda, N. Mizusawa, Y. Tanaka, H. Ina, and S. Uzawa, Proc. SPIE 3331, 689 (1998).
7. J. R. Maldonado, S. Cordes, J. Leavey, R. Acosta, F. Doany, M. Angelopoulos, and C. Waskiewicz, Proc. SPIE 3331, 245 (1998).
8. R. E. Acosta and D. Puisto, J. Vac. Sci. Technol. B 14, 4354 (1996).
9. K. Cummings, Digest of 1997 International Workshop on X-Ray and Extreme Ultraviolet Lithography (XEL'97), Yokohama, Japan, 1997, p. M4-1-1.
10. J. Rocque et al., J. Vac. Sci. Technol. B (these proceedings).
11. M. Oda, S. Uchiyama, T. Watanabe, K. Komatsu, and T. Matsuda, J. Vac. Sci. Technol. B 14, 4366 (1996).
12. M. Sugawara, M. Kobayashi, and Y. Yamaguchi, J. Vac. Sci. Technol. B 7, 1561 (1989).
13. T. Yoshihara, S. Kotsuji, and K. Suzuki, J. Vac. Sci. Technol. B 14, 4363 (1996).
14. T. Yoshihara, S. Kotsuji, K. Fujii, S. Tsuboi, and K. Suzuki, J. Vac. Sci. Technol. B (these proceedings).
15. K. Marumoto et al., J. Vac. Sci. Technol. B 14, 4359 (1996).
16. A. Fisher, G. Dicks, R. Engelstad, E. Lovell, J. Liddle, and D. Puisto, J. Vac. Sci. Technol. B (these proceedings).
17. J. D. Rockrohr et al., Proc. SPIE 2437, 160 (1995).
18. R. Jagannathan (private communication).
19. M. Sturans et al., J. Vac. Sci. Technol. B (these proceedings).
20. A. Ishitani, Digest of 1997 International Workshop on X-Ray and Extreme Ultraviolet Lithography (XEL'97), Yokohama, Japan, 1997, M2-1-1.
21. R. E. Acosta (to be published).
22. In one anomalous case out of many experiments, significantly larger distortion was observed; although its cause is still under investigation, a variety of analyses indicate that it was not due to radiation.
23. S. Hector et al., J. Vac. Sci. Technol. B 15, 2517 (1997).
24. Y. Kikuchi et al., Jpn. J. Appl. Phys., Part 1 35, 6452 (1996).
25. T. Hori and T. Takayama, Digest of International Workshop on X-Ray and Extreme Ultraviolet Lithography (XEL'95), Osaka, Japan, 1995, p. 25-1.
26. K. Saitoh et al., J. Vac. Sci. Technol. B 14, 4303 (1996).
27. K. Sentoku and T. Matsumoto, J. Vac. Sci. Technol. B (these proceedings).
28. A. C. Chen et al., Proc. SPIE 3048, 200 (1997).
29. A. C. Chen, A. W. L. Flamholz, R. H. Fair, D. A. Heald, and R. J. Amodeo, J. Vac. Sci. Technol. B 15, 2476 (1997).
30. K. Simon, R. Macklin, R. A. Selzer, Q. T. Leonard, and F. Cerrina, Proc. SPIE 3048, 168 (1997).
31. K. Simon, T. Bettes, and R. Selzer, J. Vac. Sci. Technol. B (these proceedings).
32. Y. Tanaka et al., J. Vac. Sci. Technol. B (these proceedings).
33. T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, J. Vac. Sci. Technol. B (these proceedings).
34. S. Aya et al., J. Vac. Sci. Technol. B (these proceedings).
35. R. DellaGuardia et al., Proc. SPIE 2437, 112 (1995).
36. Y. Nishioka et al., Tech. Dig. Int. Electron Devices Meet. 1995, 903 (1995).
37. K. Sunouchi et al.; Tech. Dig. Int. Electron Devices Meet. 1996, 601l (1995).
38. S. Subbana et al., Tech. Dig. Int. Electron Devices Meet. 1994, 695 (1994).
39. K. Deguchi, K. Miyoshi, H. Ban, T. Matsuda, T. Ohno, and Y. Kado, J. Vac. Sci. Technol. B 13, 3040 (1995).
40. M. Thompson, DARPA Advanced Lithography Review, Sarasota, FL, January 1996 (unpublished).
41. S. J. Wind et al., J. Vac. Sci. Technol. B 13, 2688 (1995).
42. R. Longo et al., The 1998 Symposium on VLSI Technology, Digest of Technical Papers, Honolulu, Hawaii, 1998, p. 82.