Watermark defect formation and removal for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Chang, Ching Yu ^a   Yu, Da Ching ^a   Lin, John C H ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Chemically amplified reaction; Defects; Immersion lithography; Leaching; Protective coating; TARC; Water drop; Watermark

Indexed keywords

DEFECTS; PROTECTIVE COATINGS; WATERMARKING; WSI CIRCUITS;

CHEMICALLY AMPLIFIED REACTION; IMMERSION LITHOGRAPHY; TARC; WATER DROP;

LITHOGRAPHY;

EID: 33745791736     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658422     Document Type: Conference Paper

References (2)

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2. Karen Petrillo, Kaushal Patel, Rex Chen, Wenjie Li, Ranee Kwong, Peggy Lawson, Rao Varanasi, Chris Robinson, Steven J. Holmes, Dario Oil, and Kurt Kimmel. IBM Corp. (USA) Mark Slezak, Gary Dabbagh, Takashi Chiba, and Tsutomu Shimokawa. JSR Micro, Inc. (USA), Proc. SPIE, 5753, pp. 52-63,2005