Immersion defect reduction (2) - The formation mechanism and reduction of patterned defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Shiu, Lin Hung ^a   Liang, Fu Jye ^a   Chang, Hsing ^a   Chen, Chun Kuang ^a   Chen, Li Jui ^a   Gau, Tsai Sheng ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE PROCESSING; LITHOGRAPHY; OPTICAL MICROSCOPY; OPTIMIZATION; PRINTING; SCANNING ELECTRON MICROSCOPY;

IMMERSION LITHOGRAPHY; IMMERSION TECHNOLOGY/; OPTICAL MICROSCOPE IMAGES; PATTERNED DEFECTS;

PATTERN RECOGNITION;

IMAGE ANALYSIS; LITHOGRAPHY; MICROSCOPES; OPTIMIZATION; PATTERN RECOGNITION; PRINTING; SCANNING;

EID: 34248196225     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712527     Document Type: Conference Paper

References (5)

1. T. S. Gau, C. K. Chen, and B. J. Lin, "Image characterization of bubbles in water for 193-nm immersion lithography-far-field approach" JM3, 3, 61-67, 2004.
2. U. Okoroanyanwu, J. Kye, N. Yamamoto, K. Cummings, "Defectivity in water immersion lithography" Microlithography World, Nov., 2005.
3. Y. Wei, S. Brandl, F. Goodwin, D. Back, "193nm Immersion-Related Defects and Strategies of Defect Reduction" Future Fab Intl. 22, January 09, 2007.
4. F. J. Liang, H. Chang, C.R. Su, T.C. Fu, C. K. Chen, L. J. Chen, T. S. Gau, Burn J. Lin, "Immersion Defect Reduction (1) - Analysis of water leaks in an immersion scanner".
5. R. D. Deegan, O. Bakajin, T. F. Dupont, G. Huber, S. R. Nagel, T. A. Witten, "Capillary flow as the cause of ring stains from dried liquid drops" Nature, 389, 827-829, 1997.