Image characterization of bubbles in water for 193-nm immersion lithography - Far-field approach

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 61-67

  Gau, Tsai Sheng ^a   Chen, Chun Kuang ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Microlithography; Scattering; Semiconductors

Indexed keywords

APPROXIMATION THEORY; IMAGING TECHNIQUES; LITHOGRAPHY; RAYLEIGH SCATTERING; REFRACTIVE INDEX; SEMICONDUCTOR MATERIALS; SPECTRUM ANALYSIS; STATISTICAL METHODS; TEMPERATURE CONTROL;

ANGULAR-RESOLVED SPECTRA; CONTOUR PLOT; IMAGE CHARACTERIZATION; IMMERSION LITHOGRAPHY;

BUBBLES (IN FLUIDS);

EID: 2542428432     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1630602     Document Type: Article

References (10)

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