Depth of focus in multilayered media - A long-neglected phenomenon aroused by immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 21-27

  Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Depth of focus; Depth of focus budget; Diffraction; Focusing; Imaging; Mask flatness; Microlithography; Wafer flatness

Indexed keywords

COUPLED CIRCUITS; DIFFRACTION; FITS AND TOLERANCES; FOCUSING; GATING AND FEEDING; IMAGE COMPRESSION; IMAGING TECHNIQUES; MASKS; OPTICAL MULTILAYERS; PHOTORESISTORS;

DEPTH OF FOCUS; DEPTH OF FOCUS BUDGET; IMMERSION LITHOGRAPHY; MASK FLATNESS; WAFER FLATNESS;

LITHOGRAPHY;

EID: 2542455663     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1637591     Document Type: Article

References (10)

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