Simulation of optical projection with polarization-dependent stray light to explore the difference between dry and immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 1, 2004, Pages 9-20

  Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Diffraction; Immersion lithography; Microlithography; Microlithography imaging; Polarization; Stray light

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; IMAGING TECHNIQUES; LIGHTING; LITHOGRAPHY; POLARIZATION; REFLECTION; STRAY LIGHT;

DRY LITHOGRAPHY; IMMERSION LITHOGRAPHY; INCIDENT ANGLE; MICROLITHOGRAPHY IMAGING;

PROJECTION SYSTEMS;

EID: 2542440659     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1636769     Document Type: Article

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