A comparison of projection and proximity printings -from UV to x-ray

Microelectronic Engineering

Volumn 11, Issue 1-4, 1990, Pages 137-145

  Lin, B J ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LITHOGRAPHY; PRINTING;

IMAGE CONTOURS; LINEWIDTH TOLERANCE; MICROLITHOGRAPHIC IMAGING; PROJECTION PRINTING; PROXIMITY PRINTINGS; SUBHALF-MICROMETER APPLICATIONS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0025418311     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(90)90089-C     Document Type: Article

References (9)

1. On the Diffraction Theory of Optical Images
2. Computer simulation study of images in contact and near-contact printing
3. A double-exposure technique to macroscopically control submicrometer linewidths in positive resist images
4. The Paths To Subhalf-Micrometer Optical Lithography