Lithography for manufacturing of sub-65nm nodes and beyond

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 2005, Issue , 2005, Pages 48-51

  Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ECONOMIC AND SOCIAL EFFECTS; ELECTRON DEVICE MANUFACTURE; OPTICAL RESOLVING POWER;

ECONOMICAL IMPACTS; HALF PITCH; RESOLUTION ENHANCEMENT TECHNIQUES;

LITHOGRAPHY;

EID: 33847731467     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. B.J. Lin, "Semiconductor Foundry, Lithography, and Partners", Proc. SPIE 4688, 11-24 (2002).
2. B.J. Lin, "Immersion lithography and its impact on semiconductor manufacturing", J. Microlithogr., Micrfabr., Microsyst. 3, 377-395 (2004).
3. B.J. Lin, "Exposure-Defocus Forest", Jap. J. Appl. Phys. Vol. 33, p. 6756, part 1. Mo. 12B, 1994.
4. D.C. Owe-Yang, S.S. Yu, H. Chen, C.Y. Chang, B.C. Ho, C.H. Lin, and B.J. Lin, "Double exposure for the contact layer of the 65-nm node", SPIE Proceedings, 5753, 171-180, 2005.
5. P.J. Silverman, J. Microlithogr., Micrfabr., Microsyst. 4, 011006-1-5 (2005).