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Surface Engineering

Volumn 20, Issue 3, 2004, Pages 196-204

Effect of pulsed plasma processing on controlling nanostructure and properties of thin film/coatings

(4) Zhong, D a Mishra, B a Moore, J J a Madan, A b

a Department of Geology and Geological Engineering (United States)

b MVSystems Inc (United States)

Author keywords

CVD; P PECVD; Pulsed plasma processing; PVD; Thin film coatings

Indexed keywords

ANODES; CATHODES; COATINGS; DEPOSITION; ELECTRONS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; NICKEL; OSCILLATIONS; PHYSICAL VAPOR DEPOSITION; PLASMAS; SUBSTRATES; THIN FILMS;

CATHODIC ARC EVAPORATION (CAE); DC MAGNETRON CATHODES; METAL OXIDES; PULSED PLASMA PROCESSING;

NANOSTRUCTURED MATERIALS;

EID: 3242701352 PISSN: 02670844 EISSN: None Source Type: Journal
DOI: 10.1179/026708404225016382 Document Type: Conference Paper

Times cited : (13)

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