Oxygen species in HfO2 films: An in situ x-ray photoelectron spectroscopy study

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Driemeier, C ^a,b   Wallace, R M ^c   Baumvol, I J R ^a,d  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b UNIVERSITY OF TEXAS AT DALLAS   (United States)

^c The University of Texas at Dallas   (United States)

^d UNIVERSITY OF CAXIAS DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; GRAIN BOUNDARIES; OXYGEN; THERMOCHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE-RESOLVED PHOTOELECTRON ANALYSIS; CHEMICAL ORIGINS; ROOM TEMPERATURE; THERMODYNAMIC CALCULATIONS;

HAFNIUM COMPOUNDS;

EID: 34547604150     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2759198     Document Type: Article

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