Room temperature interactions of water vapor with HfO 2 films on Si

Applied Physics Letters

Volumn 88, Issue 20, 2006, Pages

  Driemeier, C ^a   Gusev, E P ^b,d   Baumvol, I J R ^a,c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c UNIVERSITY OF CAXIAS DO SUL   (Brazil)

^d QUALCOMM INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NUCLEAR REACTION ANALYSIS; OXYGENOUS SPECIES; WATER VAPOR;

DIFFUSION; ISOTOPES; MOS DEVICES; REACTION KINETICS; SILICON; THERMAL EFFECTS;

THIN FILMS;

EID: 33646891952     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2203944     Document Type: Article

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