High-density plasma etching of indium-zinc oxide films in Ar/Cl 2 and Ar/CH 4 /H 2 chemistries

Applied Surface Science

Volumn 253, Issue 5, 2006, Pages 2752-2757

  Lim, W T ^a   Stafford, L ^a   Song, Ju Il ^b   Park, Jae Soung ^b   Heo, Y W ^b   Lee, Joon Hyung ^b   Kim, Jeong Joo ^b   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

^b Kyungpook National University   (South Korea)

Author keywords

Dry etching; Indium zinc oxide

Indexed keywords

DESORPTION; DRY ETCHING; INDIUM COMPOUNDS; INDUCTIVELY COUPLED PLASMA; MIXTURES; SPUTTERING; THIN FILMS;

OPTOELECTRONIC DEVICE FABRICATION; PHYSICAL SPUTTERING;

PLASMA ETCHING;

EID: 34547258322     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.05.052     Document Type: Article

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