Amorphous ZnO-In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 505-509

  Tominaga, K ^a   Takao, T ^a   Fukushima, A ^a   Moriga, T ^a   Nakabayashi, I ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; CRYSTAL IMPURITIES; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; THIN FILMS; TRANSPARENCY; ZINC COMPOUNDS;

TERNARY COMPOUND FILMS;

CONDUCTIVE FILMS;

EID: 0037136215     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00123-9     Document Type: Article

References (6)