Kinetics driving high-density chlorine plasmas

Journal of Applied Physics

Volumn 98, Issue 6, 2005, Pages

  Stafford, L ^a   Margot, J ^a   Vidal, F ^b   Chaker, M ^b   Giroux, K ^a   Poirier, J S ^a   Quintal Lonard A ^a   Saussac, J ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION DEGREE; DRIVING KINETICS; HIGH-DENSITY CHLORINE PLASMAS; MAGNETIC-FIELD INTENSITY;

CARRIER CONCENTRATION; CHARGE CARRIERS; CHLORINE; DIFFUSION; MAGNETIC FIELD EFFECTS; PHOTODISSOCIATION;

PLASMAS;

EID: 26244464222     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2037873     Document Type: Article

References (41)

1. V. M. Donnelly, J. Vac. Sci. Technol. A 14, 1076 (1996).
2. G. A. Hebner, J. Vac. Sci. Technol. A 14, 2158 (1996).
3. G. A. Hebner, J. Appl. Phys. 80, 3215 (1996).
4. G. A. Hebner, J. Appl. Phys. 81, 578 (1997).
5. M. V. Malyshev and V. M. Donnelly, J. Vac. Sci. Technol. A 15, 550 (1997).
6. L. St-Onge, J. Margot, and M. Chaker, Appl. Phys. Lett. 72, 290 (1998).
7. M. V. Malyshev and V. M. Donnelly, Phys. Rev. E 60, 6016 (1999).
8. L. St-Onge, M. Chaker, and J. Margot, J. Vac. Sci. Technol. A 18, 2363 (2000).
9. M. V. Malyshev, N. C. M. Fuller, K. H. A. Bogart, V. M. Donnelly, and I. P. Herman, J. Appl. Phys. 88, 2246 (2000).
10. M. V. Malyshev and V. M. Donnelly, J. Appl. Phys. 88, 6207 (2000).
11. M. V. Malyshev and V. M. Donnelly, J. Appl. Phys. 90, 1130 (2001).
12. F. Neuilly, J.-P. Booth, and L. Vallier, J. Vac. Sci. Technol. A 20, 225 (2002).
13. S. C. Deshmuth and D. J. Economou, J. Appl. Phys. 72, 4597 (1992).
14. S. C. Deshmuth and D. J. Economou, J. Vac. Sci. Technol. B 11, 206 (1993).
15. C. M. Lee and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 368 (1995).
16. R. S. Wise, D. P. Lymberopoulos, and D. J. Economou, Plasma Sources Sci. Technol. 4, 317 (1995).
17. D. P. Lymberopoulos and D. J. Economou, IEEE Trans. Plasma Sci. 23, 573 (1995).
18. I. G. Kouznetsov, A. J. Lichtenberg, and M. A. Lieberman, Plasma Sources Sci. Technol. 5, 662 (1996).
19. G. I. Font, I. D. Boyd, and J. Balakrishnan, J. Vac. Sci. Technol. A 16, 2057 (1998).
20. E. Meeks, P. Ho, A. Ting, and R. J. Buss, J. Vac. Sci. Technol. A 16, 2227 (1998).
21. M. V. Malyshev, V. M. Donnelly, A. Kornblit, and N. A. Ciampa, J. Appl. Phys. 84, 137 (1998).
22. M. V. Malyshev and V. M. Donnelly, J. Appl. Phys. 87, 1642 (2000).
23. V. Midha and D. J. Economou, Plasma Sources Sci. Technol. 9, 256 (2000).
24. P. Scheubert, U. Fantz, P. Awakowicz, and H. Paulin, J. Appl. Phys. 90, 587 (2001).
25. T. Kimura, A. J. Lichtenberg, and M. A. Lieberman, Plasma Sources Sci. Technol. 10, 430 (2001).
26. D. Bose, D. Hash, T. R. Govindam, and M. Meyyappan, J. Phys. D 34, 2742 (2001).
27. R. N. Franklin, Plasma Sources Sci. Technol. 10, 162 (2001).
28. B. Ramamurthi and D. J. Economou, J. Vac. Sci. Technol. A 20, 467 (2002).
29. M. Moisan and Z. Zakrezewski, J. Phys. D 24, 1025 (1991).
30. M. V. Malyshev and V. M. Donnelly, Appl. Phys. Lett. 77, 2467 (2000).
31. L. Stafford, J. Margot, M. Chaker, and O. Pauna, J. Appl. Phys. 93, 1907 (2003).
32. J. Margot, Plasma Sources Sci. Technol. 10, 556 (2001).
33. T. Kimura and K. Ohe, Appl. Phys. Lett. 79, 2874 (2001).
34. J. E. Allen, R. L. Boyd, and P. Reynolds, Proc. Phys. Soc. London, Sect. B 70, 297 (1957).
35. L. Stafford, J. Margot, O. Langlois, and M. Chaker, J. Vac. Sci. Technol. A 21, 1247 (2003).
36. F. Vidal, T. W. Johnston, J. Margot, M. Chaker, and O. Pauna, IEEE Trans. Plasma Sci. 27, 727 (1999).
37. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), Chap., p. 142.
38. C. M. Ferreira and M. Moisan, Phys. Scr. 38, 382 (1988).
39. J. Helmsen, D. Hammer, J. Yamartino, and P. Loewenhardt, IEEE Trans. Plasma Sci. 27, 58 (1999).
40. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 16, 270 (1998).
41. E. Meeks, J. W. Shon, Y. Ra, and P. Jones, J. Vac. Sci. Technol. A 13, 2884 (1995).