Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

Microelectronic Engineering

Volumn 83, Issue 2, 2006, Pages 328-335

  Na, S W ^a   Shin, M H ^a   Chung, Y M ^a   Han, J G ^a   Jeung, S H ^a   Boo, J H ^a   Lee, N E ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

BCl3; Chlorine; Inductively coupled plasma; Plasma etching; Zinc oxychloride; ZnO

Indexed keywords

CHLORINE; OPTICAL DEVICES; PHOTORESISTORS; PLASMA ETCHING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

BCL3; OPTICAL EMISSION SPECTROSCOPY (OES); ZINC OXYCHLORIDE; ZNO;

INDUCTIVELY COUPLED PLASMA;

EID: 32044468271     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.09.007     Document Type: Article

References (23)

1. S.-J. Pearton, D.-P. Norton, K. Ip, Y.W. Heo, and T. Steiner Superlat. Microstruct. 34 2003 3
2. J.Y. Park, H.S. Kim, K.H. Lee, K.H. Kwon, and G.Y. Yeom Surf. Coat. Technol. 131 2000 247
3. D.R. Cairns, R.P. Witte, D.K. Sparacin, S.M. Sachsman, D.C. Paine, G.P. Crawford, and R. Newton Appl. Phys. Lett. 76 2000 1425
4. P.E. Burrows, G. Gu, V. Bulovic, Z. Shen, S.R. Forrest, and M.E. Thomson IEEE Trans. Electron Dev. 44 1997 1188
5. T. Minami MRS Bull. 25 2000 38
6. M. Chen, Z.L. Pei, X. Wang, C. Sun, and L.S. Wen J. Vac. Sci. Technol. A 19 2001 963
7. B. Szyszka, V. Sittinger, X. Jiang, R.J. Hong, W. Werner, A. Pflug, M. Ruske, and A. Lopp Thin Solid Films 442 2003 179
8. J.-M. Lee, K.-M. Chang, K.-K. Kim, W.-K. Choi, and S.-J. Park J. Electrochem. Soc. 148 2001 G1
9. H.-K. Kim, J.-W. Bae, T.-K. Kim, K.-K. Kim, T.-Y. Seong, and I. Adesida J. Vac. Sci. Technol. B 21 2003 1273
10. J.S. Park, H.J. Park, Y.B. Hahn, G.-C. Yi, and A. Yoshikawa J. Vac. Sci. Technol. B 21 2003 800
11. K. Ip, K.H. Baik, M.E. Overberg, E.S. Lambers, Y.W. Heo, D.P. Norton, S.J. Pearton, F. Ren, and J.M. Zavada Appl. Phys. Lett. 81 2002 3546
12. J.W. Bae, C.H. Jeong, H.K. Kim, K.K. Kim, N.G. Cho, T.Y. Seong, S.J. Park, I. Adesida, and G.Y. Yeom Jpn. J. Appl. Phys. 42 2003 L535
13. W.T. Lim, I.K. Baek, J.W. Lee, E.S. Lee, M.H. Jeon, G.S. Cho, Y.W. Heo, K.P. Norton, and S.J. Pearton Appl. Phys. Lett. 83 2003 15
14. H.-K. Kim, J.W. Bae, K.-K. Kim, S.-J. Park, T.-Y. Seong, and I. Adesida Thin Solid Films 447-448 2004 90
15. K. Ogata, T. Honden, T. Tanite, T. Kumuro, K. Koike, S. Sasa, M. Inoue, and M. Yano J. Vac. Sci. Technol. A 22 2004 531
16. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corporation Eden Prairie, MN, USA
17. D. Briggs, and J.C. Riviére D. Briggs M.P. Seah Practical Surface Analysis vol. 1 1983 Wiley New York, USA 136
18. D. Briggs, and J.C. Riviére D. Briggs M.P. Seah Practical Surface Analysis vol. 1 1983 Wiley New York, USA 443
19. X.Z. Fan, G. Xie, S.-P. Chen, S.-L. Gao, and Q.Z. Shi Thermochim. Acta 413 2004 87
20. L. Zhang, D. Wett, R. Sazargan, and T. Chassé Surf. Int. Anal. 36 2004 1479
21. R.A. Gottscho, C.W. Jurgensen, and D.J. Vitkavage J. Vac. Sci. Technol. B 10 1992 2133
22. J.J. Wang, E.S. Lambers, S.J. Pearton, M. Ostling, C.-M. Zetterling, J.M. Grow, F. Ren, and R.J. Shul Solid-State Electron. 42 1998 2283
23. Y.C. Lin, S.J. Chang, Y.K. Su, S.C. Shei, and S.J. Hsu Mater. Sci. Eng. B 98 2003 60