Silicon carbonitride thin-film coatings fabricated by remote hydrogen-nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

Journal of Applied Polymer Science

Volumn 105, Issue 1, 2007, Pages 122-129

  Wrobel, A M ^a   Blaszczyk Lezak, I ^a   Walkiewicz Pietrzykowska, A ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Films; Infrared spectroscopy; Mechanical properties; Structure property relations

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; ELASTIC MODULI; PLASMAS; STRUCTURE (COMPOSITION); SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

FRICTION COEFFICIENT; HYDROGEN NITROGEN MICROWAVE; SINGLE-SOURCE PRECURSOR; SUBSTRATE TEMPERATURE;

SILICON COMPOUNDS;

CHEMICAL VAPOR DEPOSITION; COATING; FILM; INFRARED RADIATION; SILICON; TEMPERATURE EFFECT;

EID: 34249787604     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.26109     Document Type: Article

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