The investigation of properties of silicon nitride films obtained by RPECVD from hexamethyldisilazane

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 614-617

  Fainer, N I ^a   Rumyantsev, Yu M ^a   Kosinova, M L ^a   Yurjev, G S ^a   Maximovskii, E A ^a   Kuznetsov, F A ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Hexamethyldisilazane; RPECVD; Silicon nitride; Structure; Thin films

Indexed keywords

ADDITION REACTIONS; AMMONIA; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; MIXTURES; ORGANIC COMPOUNDS; PHYSICAL PROPERTIES; SILICON NITRIDE;

HEXAMETHYLDISILAZANE; REMOTE PLASMA ENHANCE CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0031547303     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00825-2     Document Type: Article

References (9)

1. M. Yoshimoto, T. Ohtsuki, K. Takubo, M. Komoda and H. Matsunami, Jpn. J. Appl. Phys. 32 (1993) 6132.
2. J.Y.-M. Lee, K. Sooriakumar and M.M. Dange, Thin Solid Films 203 (1991) 275.
3. M. Gupta, V.R. Rathi and R. Thangarai, Thin Solid Films 204 (1991) 77.
4. V. Nguyen, J. Underhill, S. Fridman and P. Pan, J. Electrochem. Soc. 132 (1985) 1924.
5. J. Jauca, M. Nocosona and T. Sihola, Acta Phys. Slov. 33 (1983) 187.
6. D. Freeman and W. Kern, J. Vac. Sci. Technol. A 7 (1989) 1446.
7. T.P. Smirnova, L.V. Chramova and V.I. Belyi, Visokomolekuljarnie soedinenia 30 (1988) 164.
8. T.P. Smirnova, Yu.M. Rumyantsev, N.I. Fainer, Z.L. Akkerman, H.P. Sysoeva and E.G. Salman, Izv. Sib. Otd. AN SSSR 3 (1989) 52.
9. Z.L. Akkerman, N.I. Fainer, M.L. Kosinova, A.N. Korshunov, Yu.M. Rumyantsev. E.G. Salman and N.P. Sysoeva, SPIE Int. Soc. Opt. Eng. 1783 (1992) 530.