Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings

Surface and Coatings Technology

Volumn 111, Issue 2-3, 1999, Pages 184-190

  Bendeddouche, Abderrahim ^a   Berjoan, René ^b   Bêche, Eric ^b   Hillel, Roger ^a  

^a UNIVERSITÉ DE PERPIGNAN   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

CVD; Hardness; Silicon carbonitride; Stiffness

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; BOND STRENGTH (MATERIALS); CHEMICAL VAPOR DEPOSITION; HARDNESS; INTERFACES (MATERIALS); AMMONIA; CHEMICAL BONDS; ELECTRON ENERGY LEVELS; HARDNESS TESTING; MECHANICAL VARIABLES MEASUREMENT; PRESSURE EFFECTS; SILICON COMPOUNDS; STIFFNESS; THERMAL EFFECTS;

BERKOVICH INDENTER;

PROTECTIVE COATINGS; AMORPHOUS FILMS;

COATING; HARDNESS; STIFFNESS; VAPOR DEPOSITION;

BERKOVICH INDENTERS; NANOINDENTATION TESTS; SILICON CARBONITRIDE;

EID: 0032666223     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00733-6     Document Type: Article

References (22)