Structure and Chemistry of Silicon Nitride and Silicon Carbonitride Thin Films Deposited from Ethylsilazane in Ammonia or Hydrogen

Chemistry of Materials

Volumn 4, Issue 2, 1992, Pages 478-483

  Bae, Y W ^a   Du, H ^a   Gallois, B ^a   Gonsalves, K E ^a   Wilkens, B J ^b  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b TELCORDIA TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005736194     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm00020a044     Document Type: Article

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