Thin films of tetragonal zirconia (3Y-TZ) deposited by reactive sputtering

Vacuum

Volumn 81, Issue 7, 2007, Pages 911-919

  Jou, Shyankay ^a   Chi, Tien Wei ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Reactive sputtering; Thin films; X ray diffraction; Zirconia

Indexed keywords

ANNEALING; ARGON; DEPOSITION; SILICON; SPUTTERING; TEXTURES; THERMAL EFFECTS; X RAY DIFFRACTION; ZIRCONIA;

OXIDE COMPOUNDS; REACTIVE SPUTTERING; SLIDE GLASS;

THIN FILMS;

EID: 33846874545     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.11.001     Document Type: Article

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