Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

Thin Solid Films

Volumn 323, Issue 1-2, 1998, Pages 85-92

  Boulouz, M ^a   Boulouz, A ^a   Giani, A ^a   Boyer, A ^a  

^a UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

Substrate temperature; Target composition; ZrO2 Y2O3 films

Indexed keywords

FILM GROWTH; LIGHT EXTINCTION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; YTTRIUM COMPOUNDS; ZIRCONIA;

RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING;

DIELECTRIC FILMS;

EID: 0032095419     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01053-5     Document Type: Article

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