Characterization of yttria-stabilized zirconia thin films prepared by radio frequency magnetron sputtering for a combustion control oxygen sensor

Journal of the Electrochemical Society

Volumn 147, Issue 6, 2000, Pages 2380-2384

  Bae, J W ^a   Park, J Y ^a   Hwang, S W ^a   Yeom, G Y ^a   Kim, K D ^b   Cho, Y A ^b   Jeon, J S ^b   Choi, D ^b  

^a Sungkyunkwan University   (South Korea)

^b Korea Gas Corporation   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; FILM PREPARATION; IONIC CONDUCTION; MAGNETRON SPUTTERING; NICKEL; NICKEL COMPOUNDS; OXYGEN SENSORS; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS; ZIRCONIA;

ELECTROMOTIVE FORCE; RADIO FREQUENCY MAGNETRON SPUTTERING; YTTRIA STABILIZED ZIRCONIA THIN FILMS;

THIN FILMS;

EID: 0034206612     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393540     Document Type: Article

References (23)

1. T. Usui, H. Yamamoto, K. Ishibashi, and M. Nakazawa, J. Appl. Phys., 29, 606 (1990).
2. S. P. S. Badwal, Appl. Phys., A50, 449 (1990).
3. A. M. Azad, S. A. Akbar, S. G. Mhaisalkar, L. D. Birkefeld, and K. S. Goto, J. Electrochem. Soc., 139, 3690 (1992).
4. C. Nylander, J. Phys. E, Sci. Instrum., 18, 736 (1985).
5. K Saji, H. Kondo, and J. Takahashi, Sens. Actuators B, 13-14, 695 (1993).
6. N. Miura, T. Raisen, G. Lu, and N. Yamazoe, J. Electrochem. Soc., 144, L198 (1997).
7. W. D. Kingery, J. Pappis, M. E. Doty, and D. C. Hill, J. Am. Ceram. Soc., 42, 393 (1959).
8. J. Weissbart and R. Ruko, J. Electrochem. Soc., 109, 723 (1962).
9. T. Usui, H. Yamamoto, K. Ishibashi, and M. Nakazawa, Jpn. J. Appl. Phys., 29, 606 (1990).
10. T. Kenjo and T. Nakagawa, J. Electrochem. Soc., 143, L92 (1996).
11. T.J. Mazanec, Electrochem. Soc., Interface, 5, 46 (1996).
12. N. Miura, T. Raisen, G. Lu, and N. Yamazoe, J. Electrochem. Soc., 144, L198 (1997).
13. G. Velasco, J. Ph. Schnell, and M. Croset, Sens. Actuators, 2, 371 (1982).
14. N. R. Shankar, H. Herman, and S. P. Singhal, Thin Solid Films, 119, 159 (1984).
15. Y. Takahashi, T. Kawae, and M. Nasu, J. Cryst. Growth, 74, 409 (1986).
16. D. Y. Kim, C. H. Lee, and S. J. Park, J. Mater. Res., 11, 2583 (1996).
17. E. T. Kim and S. G. Yoon, Thin Solid Films, 227, 7 (1993).
18. M. Balog, M. Schieber, M. Michman, and S. Patai, J. Electrochem. Soc., 126, 1203 (1979).
19. T. Tsai and S. A. Barnett, J. Electrochem. Soc., 142, 3084 (1995).
20. M. Ohring, The Materials Science of Thin Films, p. 128, Academic Press, Hoboken, NJ (1992).
21. J. E. Greene, R. E. Klinger, L. B. Welsh, and F. R. Szofran, J. Vac. Sci. Technol., 14, 177 (1977).
22. W. T. Pawlewicz and D. D. Hays, Thin Solid Films, 94, 31 (1982).
23. A. M. Azad, S. A. Akbar, S. G. Mhaisalkar, L. D. Birkefeld, and K. S. Goto, J. Electrochem. Soc., 139, 3690 (1992).