RF-magnetron-sputtered heteroepitaxial YSZ and CeO2/YSZ/Si(0 0 1) thin films with improved capacitance-voltage characteristics

Thin Solid Films

Volumn 411, Issue 2, 2002, Pages 268-273

  Wakiya, Naoki ^a   Yoshida, Makoto ^a   Kiguchi, Takanori ^a   Shinozaki, Kazuo ^a   Mizutani, Nobuyasu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

C V measurements; CeO2; Heteroepitaxial; Radio frequency sputtering; Yttria stabilized zirconia

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE; ELECTRIC POTENTIAL; ENERGY DISPERSIVE SPECTROSCOPY; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; PULSED LASER DEPOSITION; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

C-V MEASUREMENTS; CEO2; HETEROEPITAXIAL; RADIO FREQUENCY SPUTTERING; YTTRIA-STABILIZED ZIRCONIA;

THIN FILMS;

EID: 2942666994     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00295-X     Document Type: Article

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