On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma

Microelectronic Engineering

Volumn 84, Issue 1, 2007, Pages 136-143

  Efremov, A M ^a   Kim, Gwan Ha ^b   Kim, Jong Gyu ^b   Bogomolov, A V ^a   Kim, Chang Il ^b  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^b Chung Ang University   (South Korea)

Author keywords

Cl2 Ar plasma; Density; Dissociation; Ionization; Plasma modeling; Rate coefficient

Indexed keywords

ARGON; CHEMICAL REACTORS; CHLORINE; DISSOCIATION; IONIZATION; MASS SPECTROMETERS; MATHEMATICAL MODELS; PLASMA DENSITY; PRESSURE EFFECTS; RATE CONSTANTS;

ELECTRON ENERGY DISTRIBUTION; GAS MIXING RATIO; LANGMUIR PROBE; MAXWELLIAN APPROXIMATION; PLASMA MODELLING;

INDUCTIVELY COUPLED PLASMA;

EID: 33751410786     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.09.020     Document Type: Article

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