Volume and heterogeneous chemistry of active species in chlorine plasma

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 83-88

  Efremov, A M ^a,b   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

^b IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

Author keywords

Chlorine plasma; Dissociation; Electron impact; Ionization; Rate coefficient

Indexed keywords

CHLORINE; ELECTRON ENERGY LEVELS; ETCHING;

ACTIVE SPECIES;

PLASMA APPLICATIONS;

EID: 0037671279     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00378-X     Document Type: Conference Paper

References (12)

1. Malyshev M.V., Donnelly V.M. J. Appl. Phys. 88:2000;6207.
2. Choe J.Y., Herman I.P., Donnelly V.M. J. Vac. Sci. Technol. A. 15:1997;3024.
3. Gaddy G.A., Webb S.F., Blumenthal R. Appl. Phys. Lett. 71:1997;3206.
4. Deshmukh S.C., Economou D.J. J. Vac. Sci. Technol. B. 11:1993;206.
5. Ramamurthi B., Economou D.J. J. Vac. Sci. Technol. A. 20:2002;467.
6. Physical Values, Energoatomizdat (ed.,) Moscow, 1991, p. 263 (in Russian).
7. A.P. Kupriyanovskaya, V.V. Rybkin, J.A. Sokolova, A.N. Trostin, Compilation of Elementary Processes, Cross-section Data for Calculations of Kinetic Coefficients Non-equilibrium Systems. VINITI, Cherkassy, 1990, p. 60 (in Russian).
8. Efremov A.M., Svettsov V.I. High Energy Chem. 29:1995;433.
9. Efremov A.M., Svettsov V.I., Sitanov D.V. High Energy Chem. 32:1998;123-126.
10. Efremov A.M., Kwon K.H. J. Semicond. Sci. Technol. 1:2001;197.
11. Slovetsky D.I. Mechanisms of Chemical Reactions in Non-Equilibrium Plasmas. 1980;Nauka, Moscow. p. 310 (in Russian).
12. Clyne M.A.A., Stedmane D.H. Trans. Faraday Soc. 64:1988;2968.