Inductively coupled Cl2/N2 plasma: Experimental investigation and modeling

Microelectronic Engineering

Volumn 81, Issue 1, 2005, Pages 96-105

  Kim, Gwan Ha ^a   Efremov, A M ^b   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

^b IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

Author keywords

Dissociation; Electron and ion densities; Electron temperature; Ionization; Plasma

Indexed keywords

ANISOTROPY; CARRIER CONCENTRATION; DISSOCIATION; DRY ETCHING; INDUCTIVELY COUPLED PLASMA; NITROGEN;

CARRIER GASES; ELECTRON AND ION DENSITIES; ELECTRON TEMPERATURE; PLASMA PARAMETERS;

CHLORINE;

EID: 21644473128     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.04.003     Document Type: Article

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