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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2335-2343

Pressure and input power dependence of Ar/N2H2 inductively coupled plasma systems

(2) Jang, S a Lee, W a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; HYDROGEN; NITRIDES; NITROGEN; PLASMA DENSITY; PLASMA PROBES; PRESSURE EFFECTS;

INPUT POWER DEPENDENCE;

INDUCTIVELY COUPLED PLASMA;

EID: 0035441753 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1385904 Document Type: Article

Times cited : (16)

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