Simulations of BCl3/Cl2/Ar plasmas with comparisons to diagnostic data

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2227-2239

  Meeks, Ellen ^a,c   Ho, Pauline ^b   Ting, Aili ^a   Buss, Richard J ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c Reaction Design Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032344607     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581332     Document Type: Article

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